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Accurate characterization of SiO2 thin films using surface acoustic waves

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Metadaten
Document Type:Article (reviewed)
Zitierlink: https://opus.hs-offenburg.de/1828
Bibliografische Angaben
Title (English):Accurate characterization of SiO2 thin films using surface acoustic waves
Author:Matthias Knapp, Alexey M. LomonosovStaff MemberORCiDGND, Paul Warkentin, Philipp M. Jäger, Werner Ruile, Hans-Peter Kirschner, Matthias Honal, Ingo Bleyl, Andreas MayerStaff MemberGND, Leonhard Michael ReindlORCiD
Year of Publication:2015
First Page:736
Last Page:743
Parent Title (English):IEEE transactions on ultrasonics, ferroelectrics, and frequency control
Volume:62
ISSN:1525-8955
DOI:https://doi.org/10.1109/TUFFC.2014.006921
Language:English
Inhaltliche Informationen
Institutes:Fakultät Wirtschaft (W)
Institutes:Bibliografie
GND Keyword:Akustik; Schallwelle
Formale Angaben
Licence (German):License LogoUrheberrechtlich geschützt