Accurate characterization of SiO2 thin films using surface acoustic waves
| Document Type: | Article (reviewed) |
|---|---|
| Zitierlink: | https://opus.hs-offenburg.de/1828 | Bibliografische Angaben |
| Title (English): | Accurate characterization of SiO2 thin films using surface acoustic waves |
| Author: | Matthias Knapp, Alexey M. LomonosovStaff MemberORCiDGND, Paul Warkentin, Philipp M. Jäger, Werner Ruile, Hans-Peter Kirschner, Matthias Honal, Ingo Bleyl, Andreas MayerStaff MemberGND, Leonhard Michael ReindlORCiD |
| Year of Publication: | 2015 |
| First Page: | 736 |
| Last Page: | 743 |
| Parent Title (English): | IEEE transactions on ultrasonics, ferroelectrics, and frequency control |
| Volume: | 62 |
| ISSN: | 1525-8955 |
| DOI: | https://doi.org/10.1109/TUFFC.2014.006921 |
| Language: | English | Inhaltliche Informationen |
| Institutes: | Fakultät Wirtschaft (W) |
| Institutes: | Bibliografie |
| GND Keyword: | Akustik; Schallwelle | Formale Angaben |
| Licence (German): |  Urheberrechtlich geschützt |