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Determining Elastic Constants of AlScN Films on Silicon Substrates by Laser Ultrasonics

  • Laser ultrasound was used to determine dispersion curves of surface acoustic waves on a Si (001) surface covered by AlScN films with a scandium content between 0 and 41%. By including off-symmetry directions for wavevectors, all five independent elastic constants of the film were extracted from the measurements. Results for their dependence on the Sc content are presented and compared toLaser ultrasound was used to determine dispersion curves of surface acoustic waves on a Si (001) surface covered by AlScN films with a scandium content between 0 and 41%. By including off-symmetry directions for wavevectors, all five independent elastic constants of the film were extracted from the measurements. Results for their dependence on the Sc content are presented and compared to corresponding data in the literature, obtained by alternative experimental methods or by ab-initio calculations.show moreshow less

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Metadaten
Document Type:Conference Proceeding
Conference Type:Konferenzartikel
Zitierlink: https://opus.hs-offenburg.de/4530
Bibliografische Angaben
Title (English):Determining Elastic Constants of AlScN Films on Silicon Substrates by Laser Ultrasonics
Conference:2020 IEEE International Ultrasonics Symposium (IUS), 7-11 Sept. 2020, Las Vegas, NV, USA
Author:Olga RogallStaff Member, Niclas M. Feil, Anli Ding, Elena MayerStaff MemberORCiD, Pavel Dmitrievich PupyrevStaff MemberORCiDGND, Alexey M. LomonosovStaff MemberORCiDGND, Agnė Žukauskaitė, Oliver Ambacher, Andreas MayerStaff MemberORCiDGND
Year of Publication:2020
Publisher:IEEE
First Page:1
Last Page:4
Parent Title (English):2020 Symposium Proceedings
ISBN:978-1-7281-5448-0 (digital)
ISBN:978-1-7281-5449-7 (Print on Demand)
ISSN:1948-5727 (digital)
ISSN:1948-5719 (Print on Demand)
DOI:https://doi.org/10.1109/IUS46767.2020.9251632
Language:English
Inhaltliche Informationen
Institutes:Fakultät Wirtschaft (W)
Collections of the Offenburg University:Bibliografie
Formale Angaben
Open Access: Closed Access 
Licence (German):License LogoUrheberrechtlich geschützt